Researcher profile · Semantic Scholar

T. Lill

h-index: 4
Works: 18
Citations: 92

Most-cited papers

Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
T. Lill, Ming-Mei Wang, Dongjun Wu, Youn-Jin Oh +7 more
2024Journal of Vacuum Science & Technology A36 citations
Semantic Scholar
Transgenic regal pelargoniums that express the rolC gene from Agrobacterium rhizogenes exhibit a dwarf floral and vegetative phenotype
M. Boase, C. Winefield, T. Lill, M. Bendall
2007In Vitro Cellular & Developmental Biology - Plant26 citations
Semantic Scholar
Plasma sources for advanced semiconductor applications
O. Versolato, I. Kaganovich, Kallol Bera, T. Lill +4 more
2024Applied Physics Letters14 citations Open access
Semantic Scholar
Formation and stability of ammonium fluorosilicate during etching of SiN x in CH2F2/Ar and SF6/H2 plasmas
Xue Wang, Md. Tanzid Hossain, Prabhat Kumar, T. Lill +4 more
2025Journal of Vacuum Science & Technology A10 citations
Semantic Scholar
Growth Mechanism During Initial Stages of Molecular Layer Deposition of Polyurea.
Wallis E. Scholl, Ming-Mei Wang, T. Lill, Rachel A. Nye de Castro +2 more
2025Langmuir5 citations
Semantic Scholar
Temperature dependence of the growth per cycle during molecular layer deposition of polyurea on plasma deposited SiO2
Wallis E. Scholl, Ming-Mei Wang, T. Lill, Harmeet Singh +1 more
2026Journal of Vacuum Science & Technology A2 citations
Semantic Scholar
Semiconductor Dry Etching Innovation in the Era of 3D Monolithic Integration
T. Lill, A. Fischer
2024The Electrochemical Society Interface2 citations Open access
Semantic Scholar
Effect of gas additives on reaction barriers in cryo etching of silicon oxide and nitride
Yichen Fan, T. Lill, Ming-Mei Wang, Dong-Jun Wu +4 more
2026Journal of Vacuum Science & Technology A1 citations
Semantic Scholar
Enabling 3D NAND bit cost scaling with merged etches
Johnny H. Hoang, G. Matamis, C. Pham, Hao-Di Chi +3 more
2026Japanese Journal of Applied Physics0 citations Open access
Semantic Scholar
Application of ALD and isotropic etch to 3D patterning of advanced logic and memory devices
T. Lill, H. Singh
2026Advanced Lithography0 citations
Semantic Scholar
Polyurea films deposited by molecular layer deposition for surface and sidewall passivation during HF plasma etching of high-aspect-ratio structures
Wallis E. Scholl, Xue Wang, Andrew P. Kaye, Ming-Mei Wang +4 more
2026Journal of Vacuum Science & Technology A0 citations
Semantic Scholar
Detection of silicon-containing etch products during SiN x etching in a hydrogen fluoride plasma using quadrupole mass spectrometry
Xue Wang, Md. Tanzid Hossain, Prabhat Kumar, T. Lill +4 more
2026Journal of Vacuum Science & Technology A0 citations
Semantic Scholar
Cryogenic etching and halogens
Ming-Mei Wang, Yichen Fan, Y. Barsukov, Dong-Jun Wu +3 more
2026Advanced Lithography0 citations
Semantic Scholar
Application of ALE for 3D Electronic Devices
T. Lill, A. Fischer, Fred Roozeboom
2025ECS Meeting Abstracts0 citations
Semantic Scholar
New Developments in High Aspect Ratio Etching of 3D Memory Devices
T. Lill, Ming-Mei Wang, Youn-Jin Oh, Harmeet Singh
2025ECS Meeting Abstracts0 citations
Semantic Scholar
Low Temperature Plasmas for Etching of Semiconductor Devices
A. Paterson, T. Lill, H. Singh
20252025 IEEE Pulsed Power & Plasma Science (PPPS)0 citations
Semantic Scholar
ALD and ALE Applications in 3D Monolithic Device Integration
T. Lill, A. Fischer, Fred Roozeboom
2025ECS Meeting Abstracts0 citations
Semantic Scholar
(Invited) Atomic Layer Etching: Basics, New Developments & Applications
T. Lill
2024ECS Meeting Abstracts0 citations
Semantic Scholar
Patterning of Sin and SiO2 Nanostructures for 3D Electronic Devices at Low Temperatures
T. Lill, Y. Barsukov, Youn-Jin Oh, Igor Kaganowich +1 more
2024ECS Meeting Abstracts0 citations
Semantic Scholar

Xue Wang

×3

Wallis E. Scholl×3

A. Fischer×3

Y. Barsukov×3

I. Kaganovich×2

Md. Tanzid Hossain×2

Prabhat Kumar×2

Taner Ozel×2