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M. Burkhardt · SciRah

Researcher profile · Semantic Scholar

M. Burkhardt

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M. Burkhardt — researcher profile on SciRah

h-index: 20
Works: 80
Citations: 1,393

Most-cited papers

Poly(3-alkylthiophene) diblock copolymers with ordered microstructures and continuous semiconducting pathways.
Victor Ho, Bryan W. Boudouris, B. McCulloch, C. Shuttle +3 more
2011Journal of the American Chemical Society119 citations
Semantic Scholar
Low‐Temperature Solution‐Processed Memory Transistors Based on Zinc Oxide Nanoparticles
Hendrik Faber, M. Burkhardt, Abdesselam Jedaa, D. Kälblein +2 more
2009113 citations
Semantic Scholar
Concept of a Molecular Charge Storage Dielectric Layer for Organic Thin‐Film Memory Transistors
M. Burkhardt, Abdesselam Jedaa, M. Novák, Alexander Ebel +4 more
2010Advances in Materials111 citations Open access
Semantic Scholar
The impact of self-assembled monolayer thickness in hybrid gate dielectrics for organic thin-film transistors
Abdesselam Jedaa, M. Burkhardt, U. Zschieschang, H. Klauk +3 more
200981 citations
Semantic Scholar
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
K. Lai, A. Rosenbluth, S. Bagheri, J. Hoffnagle +27 more
2009Advanced Lithography69 citations
Semantic Scholar
Integration of EUV lithography in the fabrication of 22-nm node devices
O. Wood, Chiew-seng Koay, K. Petrillo, Hiroyuki Mizuno +15 more
2009Advanced Lithography61 citations Open access
Semantic Scholar
22 nm technology compatible fully functional 0.1 μm2 6T-SRAM cell
B. Haran, Arvind Kumar, L. Adam, Josephine B. Chang +43 more
20082008 IEEE International Electron Devices Meeting59 citations
Semantic Scholar
X-ray nanolithography: Extension to the limits of the lithographic process
Henry I. Smith, M. Schattenburg, S. Hector, J. Ferrera +3 more
199640 citations
Semantic Scholar
Impact of resist blur on MEF, OPC, and CD control
T. Brunner, C. Fonseca, N. Seong, M. Burkhardt
2004SPIE Advanced Lithography39 citations
Semantic Scholar
Illuminator design for the printing of regular contact patterns
M. Burkhardt, A. Yen, C. Progler, G. Wells
199838 citations
Semantic Scholar
Best focus shift mechanism for thick masks
M. Burkhardt, A. Raghunathan
2015Advanced Lithography32 citations
Semantic Scholar
Investigation of mask absorber induced image shift in EUV lithography
M. Burkhardt, A. De Silva, J. Church, L. Meli +2 more
2019Advanced Lithography31 citations
Semantic Scholar
Insertion strategy for EUV lithography
O. Wood, J. Arnold, T. Brunner, M. Burkhardt +25 more
2012Advanced Lithography30 citations
Semantic Scholar
Investigation of alternate mask absorbers in EUV lithography
M. Burkhardt
2017Advanced Lithography29 citations
Semantic Scholar
EUV patterning successes and frontiers
N. Félix, D. Corliss, K. Petrillo, N. Saulnier +28 more
2016SPIE Advanced Lithography29 citations
Semantic Scholar
EUV lithography at the 22nm technology node
O. Wood, Chiew-seng Koay, K. Petrillo, Hiroyuki Mizuno +28 more
2010Advanced Lithography26 citations
Semantic Scholar
Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond)
G. Landié, Yong-An Xu, S. Burns, K. Yoshimoto +13 more
2011Advanced Lithography25 citations
Semantic Scholar
Modeling and experiments of non-telecentric thick mask effects for EUV lithography
G. McIntyre, Chiew-seng Koay, M. Burkhardt, Hiroyuki Mizuno +1 more
2009Advanced Lithography25 citations
Semantic Scholar
In situ STXM investigations of pentacene-based OFETs during operation
C. Hub, M. Burkhardt, M. Halik, G. Tzvetkov +1 more
201023 citations
Semantic Scholar
Focus considerations of design pitches and absorber choice for EUV random logic
M. Burkhardt, Zheng Chen, S. Halle, R. Lallement +2 more
2022Advanced Lithography22 citations
Semantic Scholar
Oligothiophenes in organic thin film transistors - Morphology, stability and temperature operation
Q. Xia, M. Burkhardt, M. Halik
200820 citations
Semantic Scholar
32 nm logic patterning options with immersion lithography
K. Lai, Sean D. Burns, S. Halle, L. Zhuang +22 more
2008SPIE Advanced Lithography17 citations
Semantic Scholar
Trilayer Development for 193 nm Immersion Lithography
S. Burns, M. Burkhardt, Darı́o L. Goldfarb, N. Lustig +4 more
200717 citations Open access
Semantic Scholar
Resonant magnetoconductance in a two-dimensional lateral-surface superlattice.
A. Toriumi, K. Ismail, M. Burkhardt, D. Antoniadis +1 more
1990Physical Review B (Condensed Matter)17 citations
Semantic Scholar
Efficient Source Mask Optimization with Zernike Polynomial Functions for Source Representation References and Links
Xiao-Fei Wu, Shi-Yuan Liu, Jia Li, Edmund Y. Lam +148 more
17 citations
Semantic Scholar
Patterning and characterization of large‐area quantum wire arrays
K. Ismail, M. Burkhardt, Henry I. Smith, N. Karam +1 more
199116 citations
Semantic Scholar
Advanced Material Studies for Additive Manufacturing in terms of Future Gear Application
J. Bräunig, T. Töppel, Bernhard Müller, M. Burkhardt +2 more
201415 citations Open access
Semantic Scholar
Flare evaluation of ASML alpha demo tool
Hiroyuki Mizuno, G. McIntyre, Chiew-seng Koay, M. Burkhardt +2 more
2009Advanced Lithography15 citations
Semantic Scholar
Dark Field Double Dipole Lithography (DDL) for back-end-of-line processes
M. Burkhardt, S. Burns, D. Dunn, T. Brunner +2 more
2007SPIE Advanced Lithography14 citations
Semantic Scholar
Top illuminated inverted organic ultraviolet photosensors with single layer graphene electrodes
M. Burkhardt, Wei Liu, C. Shuttle, K. Banerjee +1 more
201211 citations
Semantic Scholar
Overcoming the challenges of 22-nm node patterning through litho-design co-optimization
M. Burkhardt, John Arnold, Zachary Baum, Sean D. Burns +27 more
2009Advanced Lithography11 citations
Semantic Scholar
Through-pitch correction of scattering effects in 193-nm alternating phase-shift masks
M. Burkhardt, Ronald L. Gordon, M. Hibbs, T. Brunner
2002SPIE Advanced Lithography11 citations
Semantic Scholar
High performance self‐aligned sub‐100 nm metal–oxide‐semiconductor field‐effect transistors using x‐ray lithography
I. Yang, Hang Hu, Lisa T. Su, V. Wong +7 more
199411 citations
Semantic Scholar
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
J. Church, L. Meli, Jing Guo, M. Burkhardt +10 more
202010 citations
Semantic Scholar
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
S. Halle, L. Meli, Robert W. Delancey, Kaushik Vemareddy +4 more
2015Advanced Lithography9 citations
Semantic Scholar
Implementation of assist features in EUV lithography
F. Jiang, M. Burkhardt, A. Raghunathan, A. Torres +2 more
2015Advanced Lithography9 citations
Semantic Scholar
Flexible copper-7,7,8,8 tetracyanochinodimethane memory devices — Operation, cross talk and bending
M. Novák, M. Burkhardt, Abdesselam Jedaa, M. Halik
20109 citations
Semantic Scholar
Dark field Double Dipole Lithography (DDL) for 45nm node and beyond
Stephen D. Hsu, M. Burkhardt, J. Park, Douglas Van Den Broeke +1 more
2006Photomask Japan9 citations
Semantic Scholar
Fabrication using x‐ray nanolithography and measurement of Coulomb blockade in a variable‐sized quantum dot
M. Burkhardt, Henry I. Smith, D. Antoniadis, T. Orlando +3 more
19949 citations
Semantic Scholar
Fabrication of parallel quasi‐one‐dimensional wires using a novel conformable x‐ray mask technology
R. Ghanbari, W. Chu, E. Moon, M. Burkhardt +8 more
19929 citations
Semantic Scholar
Comparative mobility degradation in modulation‐doped GaAs devices after e‐beam and x‐ray irradiation
R. Ghanbari, M. Burkhardt, D. Antoniadis, Henry I. Smith +3 more
19929 citations
Semantic Scholar
The road towards aggressive pitch scaling with single exposure EUV
L. Meli, J. Church, A. De Silva, K. Petrillo +7 more
20218 citations
Semantic Scholar
Mitigation of extreme ultraviolet mask defects by pattern shifting: Method and statistics
A. Wagner, M. Burkhardt, A. B. Clay, J. Levin
20128 citations
Semantic Scholar
Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement
J. van Schoot, N. Seong, B. Geh, M. Burkhardt +6 more
2001SPIE Advanced Lithography8 citations
Semantic Scholar
Fabrication technology and measurement of coupled quantum dot devices
D. Antoniadis, Henry I. Smith, M. Burkhardt
19958 citations
Semantic Scholar
Novel UV-transparent 2-component polyurethane resin for chip-on-board LED micro lenses
J. Bauer, Marko Gutke, F. Heinrich, M. Edling +11 more
20207 citations Open access
Semantic Scholar
Spacer defined double patterning for sub-72 nm pitch logic technology
R. Kim, E. Mclellan, Yun-Peng Yin, J. Arnold +8 more
2010Advanced Lithography7 citations
Semantic Scholar
Clear sub-resolution assist features for EUV
M. Burkhardt, G. McIntyre, R. Schlief, Lei Sun
2014Advanced Lithography6 citations
Semantic Scholar
Gap control in the fabrication of quantum-effect devices using X-ray nanolithography
M. Burkhardt, S. Silverman, Henry I. Smith, D. Antoniadis +2 more
19956 citations
Semantic Scholar
EUV sub-resolution assist feature impact: experimental and simulation evaluation
Zheng Chen, M. Burkhardt, S. Sieg, L. Meli
2023Advanced Lithography5 citations
Semantic Scholar

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