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Tetsuaki Matsunawa · SciRah

Researcher profile · Semantic Scholar

Tetsuaki Matsunawa

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Tetsuaki Matsunawa — researcher profile on SciRah

h-index: 11
Works: 33
Citations: 614

Most-cited papers

A new lithography hotspot detection framework based on AdaBoost classifier and simplified feature extraction
Tetsuaki Matsunawa, Jhih-Rong Gao, Bei Yu, David Z. Pan
2015Advanced Lithography100 citations
Semantic Scholar
Optical proximity correction with hierarchical Bayes model
Tetsuaki Matsunawa, Bei Yu, David Z. Pan
2015Advanced Lithography96 citations
Semantic Scholar
Data Efficient Lithography Modeling With Transfer Learning and Active Data Selection
Yibo Lin, Meng Li, Yuki Watanabe, Taiki Kimura +3 more
2018IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems60 citations Open access
Semantic Scholar
Automatic layout feature extraction for lithography hotspot detection based on deep neural network
Tetsuaki Matsunawa, Shigeki Nojima, T. Kotani
2016SPIE Advanced Lithography46 citations
Semantic Scholar
Machine learning and pattern matching in physical design
Bei Yu, David Z. Pan, Tetsuaki Matsunawa, Xuan Zeng
2015Asia and South Pacific Design Automation Conference43 citations
Semantic Scholar
Accurate lithography simulation model based on convolutional neural networks
Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima
2017Photomask Japan41 citations
Semantic Scholar
A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation
Xiao-Qing Xu, Tetsuaki Matsunawa, Shigeki Nojima, C. Kodama +2 more
2016ACM International Symposium on Physical Design37 citations
Semantic Scholar
Subresolution Assist Feature Generation With Supervised Data Learning
Xiao-Qing Xu, Yibo Lin, Meng Li, Tetsuaki Matsunawa +4 more
2018IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems35 citations Open access
Semantic Scholar
Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning
Yibo Lin, Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa +3 more
2018ACM International Symposium on Physical Design27 citations
Semantic Scholar
Optical proximity correction with hierarchical Bayes model
Tetsuaki Matsunawa, Bei Yu, David Z. Pan
201624 citations
Semantic Scholar
Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation
Yoichi Tomioka, Tetsuaki Matsunawa, C. Kodama, Shigeki Nojima
2017Asia and South Pacific Design Automation Conference16 citations
Semantic Scholar
Accurate lithography simulation model based on convolutional neural networks
Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima
2017Advanced Lithography12 citations
Semantic Scholar
Laplacian eigenmaps- and Bayesian clustering-based layout pattern sampling and its applications to hotspot detection and optical proximity correction
Tetsuaki Matsunawa, Bei Yu, David Z. Pan
201611 citations
Semantic Scholar
Hotspot prevention and detection method using an image-recognition technique based on higher-order local autocorrelation
H. Nosato, H. Sakanashi, E. Takahashi, M. Murakawa +4 more
201411 citations
Semantic Scholar
Laplacian eigenmaps and bayesian clustering based layout pattern sampling and its applications to hotspot detection and OPC
Tetsuaki Matsunawa, Bei Yu, David Z. Pan
2016Asia and South Pacific Design Automation Conference8 citations
Semantic Scholar
Generator of predictive verification pattern using vision system based on higher-order local autocorrelation
Tetsuaki Matsunawa, S. Maeda, Hirotaka Ichikawa, Shigeki Nojima +6 more
2012Advanced Lithography8 citations
Semantic Scholar
Adaptive Optical Proximity Correction Using an Optimization Method
Tetsuaki Matsunawa, H. Nosato, H. Sakanashi, M. Murakawa +5 more
2007International Conference on Computer and Information Technology7 citations
Semantic Scholar
Hotspot detection using image pattern recognition based on higher-order local auto-correlation
S. Maeda, Tetsuaki Matsunawa, Ryuji Ogawa, Hirotaka Ichikawa +16 more
2011Advanced Lithography6 citations
Semantic Scholar
The novel approach for optical proximity correction using genetic algorithms
Tetsuaki Matsunawa, H. Nosato, H. Sakanashi, M. Murakawa +6 more
2005SPIE Photomask Technology6 citations
Semantic Scholar
Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization
Masaki Kuramochi, Y. Kohira, Hiroyoshi Tanabe, Tetsuaki Matsunawa +1 more
2024IEEE Access5 citations Open access
Semantic Scholar
Compact resist model using single convolution kernel
Taiki Kimura, Tetsuaki Matsunawa, S. Mimotogi
20204 citations
Semantic Scholar
Clean pattern matching for full chip verification
Satomi Nakamura, Tetsuaki Matsunawa, C. Kodama, Takanori Urakami +4 more
2012Advanced Lithography4 citations
Semantic Scholar
Ultimately accurate SRAF replacement for practical phases using an adaptive search algorithm based on the optimal gradient method
S. Maeda, H. Nosato, Tetsuaki Matsunawa, Masahiro Miyairi +7 more
2010Advanced Lithography4 citations
Semantic Scholar
Hybrid hotspot detection using regression model and lithography simulation
Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, David Z. Pan
2016SPIE Advanced Lithography3 citations
Semantic Scholar
Automatic Parameter Extraction for a Physics-Based MOSFET Model Using Neighborhood Parallel Simulated Annealing and Adam with Augmented Lagrangian
Noriyuki Egawa, Tetsuaki Matsunawa, D. Navarro
2025International Conference on Mathematics and Computing1 citations
Semantic Scholar
A Fast Method of Adaptive Optical Proximity Correction using Region Segmentation
H. Nosato, Tetsuaki Matsunawa, H. Sakanashi, M. Murakawa +1 more
20061 citations
Semantic Scholar
Application of the Orthogonal QD Algorithm with Shift to Singular Value Decomposition for Large Sparse Matrices
Hiroki Tanaka, Taiki Kimura, Tetsuaki Matsunawa, S. Mimotogi +3 more
20210 citations
Semantic Scholar
Lithography hotspot candidate detection using coherence map
Tetsuaki Matsunawa, Taiki Kimura, Shigeki Nojima
2019Advanced Lithography0 citations
Semantic Scholar
Multi-criteria hotspot detection using pattern classification
Kazufumi Shiozawa, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima +1 more
2019Advanced Lithography0 citations
Semantic Scholar
Deep learning in DFM applications (Conference Presentation)
Tetsuaki Matsunawa, Shigeki Nojima
2018Photomask Technology 20180 citations
Semantic Scholar
SOCS based post-layout optimization for multiple patterns with light interference prediction
Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, David Z. Pan
2017Advanced Lithography0 citations
Semantic Scholar
Optical Proximity Correction using an Optimization Method after Layout Design
Tetsuaki Matsunawa, H. Nosato, H. Sakanashi, M. Murakawa +5 more
20070 citations Open access
Semantic Scholar
Improving the efficiency of pattern extraction for character projection lithography using OPC optimization
H. Nosato, Tetsuaki Matsunawa, H. Sakanashi, M. Murakawa +1 more
2007SPIE Photomask Technology0 citations Open access
Semantic Scholar

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Shigeki Nojima×17
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Taiki Kimura×10
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H. Nosato×9
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H. Sakanashi — researcher profile on SciRah

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M. Murakawa — researcher profile on SciRah

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T. Kotani — researcher profile on SciRah

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